摘要
This paper presents an innovative R2R(run to run)control strategy.This novel approach has made use of circuit design structure through virtually put up the structure before reach the actual structure developing step.The most significant difference between this approach and other R2R control strategies is this approach can solve issues caused by limitation of metrology instrument such as measuring target is inside a deep hole and cannot be measured clearly.Furthermore,the study proposed a multi-steps rolling wave control plan to safeguard the outcome of this control strategy.Although this control strategy has only performed trials on DRAM(Dynamic Random Access Memory)manufacturing process but it can be applied to other industry as well.
基金
supported by my department manager Haw-Jyue Luo for gently sharing his years of semiconductor manufacturing experience.
