摘要
以钼为基加入少量钛、锆或钽是应用非常普遍的高强韧钼合金,广泛用于高端医疗核电航空航天及溅射靶材等领域,其中的添加元素钛、钽、锆分析通常采用传统化学方法,周期长、效率低,实验采用电感耦合等离子体光谱仪,通过样品溶解、分析线选择、基体干扰分析等方面的考察,建立了分析方法,校准曲线在Ti质量分数0.0030%~8.00%范围内相关系数为0.999,Ta质量分数0.025%~1.00%范围内相关系数为0.999,Zr质量分数0.0080%~1.00%范围内相关系数为0.999,Ti、Ta、Zr的相对标准偏差(RSD)分别为1.68%、2.20%、3.51%,加标回收率Ti为99.6%~104%、Ta为98.8%~110%、Zr为98.8%~110%,分析结果同化学方法一致,极大的提高了分析效率,满足质量控制的要求。
Molybdenum based alloy withsmall amount of titanium,zirconium or tantalum addition has high strength and toughness,which is widely used in high-end medical,nuclear power,aerospace,sputtering target and other fields.The analysis of titanium,tantalum and zirconium is usually performed by traditional chemical methods with long cycle and low efficiency.In this paper,inductively coupled plasma spectrometer was used to establish the analysis method through the investigation of sample dissolution,analysis line selection and matrix interference analysis.Results show that the correlation coefficients of calibration curves are 0.999 in the range of Ti mass fraction from 0.0030%to 8.00%,0.999 in the range of Ta mass fraction from 0.025%to 1.00%,and 0.999 in the range of Zr mass fraction from 0.0080%to 1.00%.The relative standard deviations(RSD)of Ti,Ta and Zr are 1.68%,2.20%and 3.51%,respectively.The recoveries of Ti,Ta and Zr are 99.6%-104%,98.8%-110%and 98.8%-110%,respectively.The analysis results are consistent with the chemical method,which greatly improves the analysis efficiency and meets the requirements of quality control.
作者
颜晓华
魏修宇
石建光
Yan Xiaohua;Wei Xiuyu;Shi Jianguang(State Key Laboratory of Cemented Carbide,Zhuzhou Hunan 412000,China;Laboratory of Industrial Product(Cemented Carbide and Tungsten Products)Quality Control and Technical Evaluation,Zhuzhou Hunan 412000,China;Zhuzhou Cemented Carbide Group Corp.Ltd.,Zhuzhou Hunan 412000,China)
出处
《硬质合金》
CAS
2021年第6期441-445,共5页
Cemented Carbides
基金
国家重点研发计划“难熔金属废料高效回收与清洁提取技术与装备”项目(2018YFC1901701)。
关键词
钼基合金
电感耦合等离子体光谱仪
钛
钽
锆
molybdenum base alloy
inductively coupled plasma spectrometer
titanium
tantalum
zirconium
