摘要
随着虚拟现实(AR)、超高清分辨技术的逐步推广,市场对显示屏的像素密度要求越来越高。本文基于传统光学对焦系统架构和原理,开展了对超高像素密度图形在光刻工艺中对焦精度和实时控制的研究,根据系统结构,分析出主要干扰源,并根据干扰贡献值进行了评估。结果表明,由于底层图像密度过大,原有的对焦控制系统在测量光刻胶表面高度时受到底层图像干扰,当像素密度大于1200PPI时,为了在后续曝光层达到±10μm之间精度99.5%的对焦控制,需要在原有信号处理技术上过滤掉干扰信号。
With the gradual promotion of augmented reality(AR)and ultra-high-definition resolution technology,the market has higher and higher requirements for the pixel density of the display screen.Based on the traditional optical focusing system architecture and principle,this paper studies the focusing accuracy and real-time control of ultra-high pixel density graphics in photolithography.According to the system structure,the main interference sources are analyzed and evaluated according to the interference contribution value.The results show that the original focusing control system is interfered by the bottom image when measuring the height of the photoresist surface due to the excessive density of the bottom image.When the pixel density is greater than 1200 PPI,in order to achieve the focusing control with an accuracy of 99.5%between±10 microns in the subsequent exposure layer,it is necessary to filter out the interference signal on the original signal processing technology.
作者
薛瑞
XUE Rui(Applied Materials(Xi'an)Co.,Ltd.,Xi'an,Shaanxi Province,710000 China)
出处
《科技创新导报》
2022年第29期68-71,共4页
Science and Technology Innovation Herald
关键词
虚拟现实
光刻工艺
对焦控制
超高像素密度
卡尔曼滤波
Augmented reality
Lithography process
Focus control
Ultra-high pixel density
Kalman filtering
