摘要
提出一种扫描电镜(SEM)扫描云纹法的相移新技术,通过SEM系统控制电镜电子束扫描线移动,对获取的云纹图像实现0-2π范围内的四步相移,从而获得了更高的位移测量灵敏度。同时对SEM扫描云纹法的测量原理以及相移实验技术的原理进行了详细的阐述。并将该技术应用到电子封装试件栅的相移分析中。实验结果证明了该方法的可行性,该方法为微米云纹法的条纹处理提供了一种新途径。
A new phase shifting technique for scanning electron microscope(SEM) scanning moire method is proposed. The phase shifting was realized in four steps from 0 to 2π by shifting electron beam controlled by the SEM. In this method, holographic grating is replicated to the testing area of the specimens to generate SEM scanning moire. A scanning electron beam, which carries equally spaced grid, is exposed on the specimen. The electron beam on the specimen with the model grid produces moire fringes of bright and dark lines on the monitor of SEM. The phase shifting technique used in electron moire method provides a new way for disposal of fringes pattern in sub-micro moire method. The principle of electron moire method and phase shifting technique related to electron moire method are explained, and the method is applied to determine the phase distribution in SEM moire formed by a deformed grating with frequency of 1200 lines/mm in an electronic package. The experiment proves the validity of this technique, and shows that the sensitivity of experiments is highly improved after phase shifting technique contrasting to common electron beam moire method.
出处
《光学技术》
EI
CAS
CSCD
2003年第1期5-7,共3页
Optical Technique
基金
国家自然科学基金资助项目(19472038)
清华大学振动与结构工程开放实验室基金
关键词
SEM
扫描云纹法
电子束云纹
相移技术
全息光栅
Diffraction gratings
Electron beams
Holographic optical elements
Moire fringes
Scanning electron microscopy
