摘要
介绍了脉冲激光沉积法(PLD)制备薄膜技术的原理、特点和这一研究领域的现状,着重介绍了脉冲激光沉积薄膜技术的研究动态和进展情况。大量研究表明,脉冲激光沉积法是一种最好的制备薄膜的方法之一。
In this paper, the principle and characteristics of pulsed laser deposition method and the current status of this area of research are reviewed. The development and trends of this new technique are analyzed emphatically. Much research has shown that pulsed laser vapor deposition is a new promising technique for growing thin films.
出处
《材料导报》
EI
CAS
CSCD
2003年第12期73-76,共4页
Materials Reports
基金
国家自然科学基金(批准号:10276037)
国家863惯性约束聚变领域资助课题
