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一款600V VDMOS终端结构的设计 被引量:8

Design of a 600 V VDMOS Termination Structure
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摘要 设计了一款600V VDMOS功率器件的终端保护环结构,采用场限环与复合场板相结合的方式降低硅表面的电场峰值,且表面电场分布均匀.在159μm终端长度上仿真实现了670V的耐压,表面电场最大值为2.36e5V*cm-1,提高了终端的可靠性;工艺简单,同时没有增加额外的掩膜与步骤. The termination structure of 600 V VDMOS has been designed ,which consists of the field limit ring and the complex filed plate to reduce the peak of the electric field and make it flat at the silicon surface . By the simulation ,the breakdown-voltage 670 V has been achieved with 159 μm length termination structure ,and the termination′s reliability has been improved owing to 2 .36e5 V *cm -1 of the maximum surface electric-field .The process technology of this device is simple without additional masks and steps .
出处 《微电子学与计算机》 CSCD 北大核心 2014年第6期129-132,共4页 Microelectronics & Computer
基金 国家自然科学基金重大项目(60990320 60990323) 国家自然科学基金面上项目(61271090) 国家高技术研究发展计划("八六三"计划)重大项目(2012AA0123) 四川省科技支撑计划项目(2012GZ0101)
关键词 功率器件 终端 表面电场 耐压 power device termination structure surface electric field breakdown voltage
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  • 1项骏,林争辉.600伏高压LDMOS的实现[J].微电子学与计算机,2004,21(11):149-152. 被引量:7
  • 2维捷斯拉夫·本达,约翰·戈沃,邓肯A·格兰特.功率半导体器件-理论及应用.化学工业出版社,2005,05.P99-104.
  • 3B.Jayant Baliga Power Semiconductor Devices. Publisher: PWS Pub. Co.;1st edition May 2, 1995. P76o.
  • 4TEMPLE V. Increasing avalanche breakdown voltage and controlled surface electric field using a junction termination extension technique [J]. IEEE Trans Elec Dev, 1983, 30(8): 954-957.
  • 5STEFANOY E, CHARITAT G. Design methodology and simulation tool for floating ring termination [J]. Sol Sta Elec, 1998, 42(12) : 2251-2257.
  • 6SOUZA M. A novel area efficient floating field limit ring edge termination technique [J]. Sol Sta Elec, 2000, 44(8).. 1381-1386.
  • 7HE J, CHAN M, ZHANG X, et al. A new analytic method to &,sign multiple floating field limiting rings of power devicc.s [J]. Sol Sta Elec, 2006, 50(8): 1375-1381.
  • 8LIAO C N. Potential and electric field distribution analysis of field limiting ring and field plate by device simulator [C] // IEEE Conf Power Elec Drive Syst. Bangkok. 2007: 451-455.
  • 9PADMANABHAN V, RHINEHART R. A novel termination criterion for optimization [C] // Americ Control Conf Proc. Portland, OR, USA. 2005.. 2281- 2286.
  • 10KIM Y H, LEE H S. A new edge termination technique to improve voltage blocking capability and reliability of field limiting ring for power devices [C] //IEEE Int Conf Integr Circ Des Technol. Austin, TX, USA. 2008. 71-74.

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