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Etching Mechanism of Ti_(3)C_(2)Cl_(2) MXene Phases by CuCl_(2)-Lewis Molten Salt Method
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作者 严明 ZHU Yu +5 位作者 HUANG Jiangtao CHEN Haoyu DENG Yuxiao CHEN Yanlin 王娟 Jan-Michael Albina 《Journal of Wuhan University of Technology(Materials Science)》 SCIE EI CAS CSCD 2024年第4期863-868,共6页
We described a method for obtaining fluorine-free Ti_(3)C_(2)Cl_(2)MXene phases by melting copper in CuCl_(2)instead of aluminum in Ti_(3)AlC_(2).XRD results show that when molten salt CuCl_(2)etches Ti_(3)AlC_(2),it ... We described a method for obtaining fluorine-free Ti_(3)C_(2)Cl_(2)MXene phases by melting copper in CuCl_(2)instead of aluminum in Ti_(3)AlC_(2).XRD results show that when molten salt CuCl_(2)etches Ti_(3)AlC_(2),it forms an intermediate product Ti_(3)CuC_(2),and then reacts with Ti_(3)CuC_(2)to obtain Ti_(3)C_(2)Cl_(2).The reaction of Ti_(3)AlC_(2)and CuCl_(2)at a temperature of 800℃for 2 h to obtain Ti_(3)C_(2)Cl_(2)with an optimal lamellar structure is shown in SEM results.The pseudopotential plane-wave(PP-PW)method is used to calculate on the electronic structure.The etching mechanism is investigated by the total energies of each substance.The chemical reaction of Ti_(3)AlC_(2)and CuCl_(2)will first become Ti_(3)CuC_(2)and Cu,and then become Ti_(3)C_(2)Cl_(2)during the Lewis acid etching process,which are consistent with the experimental results. 展开更多
关键词 molten salt method CuCl_(2) MXene first-principles calculations etching mechanism
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Simulation of incompressible multiphase flows with complex geometry using etching multiblock method 被引量:1
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作者 Haoran LIU Kai MU Hang DING 《Applied Mathematics and Mechanics(English Edition)》 SCIE EI CSCD 2016年第11期1405-1418,共14页
The incompressible two-phase flows are simulated using combination of an etching multiblock method and a diffuse interface (DI) model, particularly in the com- plex domain that can be decomposed into multiple rectan... The incompressible two-phase flows are simulated using combination of an etching multiblock method and a diffuse interface (DI) model, particularly in the com- plex domain that can be decomposed into multiple rectangular subdomains. The etching multiblock method allows natural communications between the connected subdomains and the efficient parallel computation. The DI model can consider two-phase flows with a large density ratio, and simulate the flows with the moving contact line (MCL) when a geometric formulation of the MCL model is included. Therefore, combination of the etch- ing method and the DI model has potential to deal with a variety of two-phase flows in industrial applications. The performance is examined through a series of numerical exper- iments. The convergence of the etching method is firstly tested by simulating single-phase flows past a square cylinder, and the method for the multiphase flow simulation is vali- dated by investing drops dripping from a pore. The numerical results are compared with either those from other researchers or experimental data. Good agreement is achieved. The method is also used to investigate the impact of a droplet on a grooved substrate and droplet generation in flow focusing devices. 展开更多
关键词 etching multiblock method complex geometry multiphase flow movingcontact line (MCL) MULTIBLOCK
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FIB Secondary Etching Method for Fabrication of Fine CNT Forest Metamaterials 被引量:1
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作者 Adam Pander Akimitsu Hatta Hiroshi Furuta 《Nano-Micro Letters》 SCIE EI CAS 2017年第4期73-80,共8页
Anisotropic materials, like carbon nanotubes(CNTs), are the perfect substitutes to overcome the limitations of conventional metamaterials; however, the successful fabrication of CNT forest metamaterial structures is s... Anisotropic materials, like carbon nanotubes(CNTs), are the perfect substitutes to overcome the limitations of conventional metamaterials; however, the successful fabrication of CNT forest metamaterial structures is still very challenging. In this study, a new method utilizing a focused ion beam(FIB) with additional secondary etching is presented, which can obtain uniform and fine patterning of CNT forest nanostructures for metamaterials and ranging in sizes from hundreds of nanometers to several micrometers. The influence of the FIB processing parameters on the morphology of the catalyst surface and the growth of the CNT forest was investigated, including the removal of redeposited material,decreasing the average surface roughness(from 0.45 to 0.15 nm), and a decrease in the thickness of the Fe catalyst.The results showed that the combination of FIB patterning and secondary etching enabled the growth of highly aligned, highdensity CNT forest metamaterials. The improvement in the quality of single-walled CNTs(SWNTs), defined by the very high G/D peak ratio intensity of 10.47, demonstrated successful fine patterning of CNT forest for the first time. With a FIB patterning depth of 10 nm and a secondary etching of 0.5 nm, a minimum size of 150 nm of CNT forest metamaterials was achieved. The development of the FIB secondary etching method enabled for the first time, the fabrication of SWNT forest metamaterials for the optical and infrared regime, for future applications, e.g., in superlenses, antennas,or thermal metamaterials. 展开更多
关键词 Carbon nanotubes Metamaterial FIB patterning Secondary etching method Chemical vapor deposition
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In-situ Characterization of Non-aqueous Nano-dispersion Systems by Freeze-etching TEM and Comparative Study with Laser Scattering Method
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作者 欧忠文 《Journal of Wuhan University of Technology(Materials Science)》 SCIE EI CAS 2010年第3期432-436,共5页
In-situ characterization of non-aqueous nano-dispersion systems(NANDS) by freeze-etching transmission electron microscope(FETEM) was reported.To improve just-for-once successive rate of specimen preparation and ge... In-situ characterization of non-aqueous nano-dispersion systems(NANDS) by freeze-etching transmission electron microscope(FETEM) was reported.To improve just-for-once successive rate of specimen preparation and get good characterization results,an improving specimen preparation method of freezing etching was developed.Size,distribution and morphology of NANDS were directly visualized.Some information of particle dispersion feature and particle density can also be obtained.Reproductivity of the FETEM characterization is excellent.Comparing with laser scattering method,which is liable to give positive error especially for small size particle anchoring disperser,FETEM characterization can give more accurate measurement of particle size.Moreover,FETEM can give dispersion feature of nanoparticle in non-aqueous medium. 展开更多
关键词 non-aqueous nano-dispersion system dispersion state in-situ characterization FREEZE-etching laser scattering method
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Adsorption of CO_(2) on MgAl layered double hydroxides: Effect of intercalated anion and alkaline etching time 被引量:3
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作者 Yan-Yan Feng Xiao-Di Niu +1 位作者 Yong-Hui Xu Wen Yang 《Chinese Physics B》 SCIE EI CAS CSCD 2021年第4期542-549,共8页
The adsorption of CO_(2) on MgAl layered double hydroxides(MgAl-LDHs) based adsorbents has been an effective way to capture CO_(2),however the adsorption capacity was hampered due to the pore structure and the dispers... The adsorption of CO_(2) on MgAl layered double hydroxides(MgAl-LDHs) based adsorbents has been an effective way to capture CO_(2),however the adsorption capacity was hampered due to the pore structure and the dispersibility of adsorption active sites.To address the problem,we investigate the effect of intercalated anion and alkaline etching time on the structure,morphology and CO_(2) uptake performances of MgAl-LDHs.MgAl-LDHs are synthesized by the onepot hydrothermal method,followed by alkaline etching of NaOH,and characterized by x-ray diffraction,N_(2) adsorption,scanning electron microscopy and Fourier transform infrared spectroscopy.The CO_(2) adsorption tests of the samples are performed on a thermogravimetric analyzer,and the adsorption data are fitted by the first-order,pseudo-second-order and Elovich models,respectively.The results demonstrate that among the three intercalated samples,MgAl(Cl) using chloride salts as precursors possesses the highest adsorption capacity of CO_(2),owing to high crystallinity and porous structure,while MgAl(Ac) employing acetate salts as precursors displays the lowest CO_(2) uptake because of poor crystallinity,disorderly stacked structure and unsatisfactory pore structure.With regard to alkaline etching,the surface of the treated MgAl(Cl) is partly corroded,thus the specific surface area and pore volume increase,which is conducive to the exposure of adsorption active sites.Correspondingly,the adsorption performance of the alkaline-etched adsorbents is significantly improved,and MgAl(Cl)-6 has the highest CO_(2) uptake.With the alkaline etching time further increasing,the CO_(2) adsorption capacity of MgAl(Cl)-9 sharply decreases,mainly due to the collapse of pore structure and the fragmentized sheet-structure.Hence,the CO_(2) adsorption performance is greatly influenced by alkaline etching time,and appropriate alkaline etching time can facilitate the contact between CO_(2) molecules and the adsorbent. 展开更多
关键词 CO_(2)adsorption Mg Al-LDHs one-pot hydrothermal method intercalated anion alkaline etching
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Preparation of Electrode Array by Electrochemical Etching Based on FEM
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作者 Minghuan WANG Di ZHU Lei WANG 《Journal of Materials Science & Technology》 SCIE EI CAS CSCD 2008年第6期845-849,共5页
Process technology of multiple cylindrical micro-pins by wire-electrical discharge machining (wire-EDM) and electrochemical etching was presented. A row of rectangular micro-columns were machined by wire-EDM and the... Process technology of multiple cylindrical micro-pins by wire-electrical discharge machining (wire-EDM) and electrochemical etching was presented. A row of rectangular micro-columns were machined by wire-EDM and then machined into cylindrical shape by electrochemical etching. However, the shape of the multiple electrodes and the consistent sizes of the electrodes row are not easy to be controlled. In the electrochemical process, the shape of the cathode electrode determines the current density distribution on the anode and so the forming of multiple electrodes. This paper proposes a finite element method (FEM) to accurately optimize the electrode profile. The microelectrodes row with uniformity diameters with size from hundreds micrometers to several decades could be fabricated, and mathematical model controlling the shape and diameter of multiple microelectrodes was provided. Furthermore, a good agreement between experimental and theoretical results was confirmed. 展开更多
关键词 Electrode array Electrochemical etching Finite element method (FEM) Micro-electrodes
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Angular Effects on F+ Etching SiC: MD Study
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作者 CHEN Xu TIAN Shuping +5 位作者 HE Pingni ZHAO Chengli SUN Weizhong ZHANG Junyuan CHEN Feng GOU Fujun 《Plasma Science and Technology》 SCIE EI CAS CSCD 2012年第12期1102-1105,共4页
Molecular dynamics (MD) simulations were performed to investigate F+ continuously bombarding SiC surfaces with energies of 100 eV at different incident angles at 300 K. The simulated results show that the steady-st... Molecular dynamics (MD) simulations were performed to investigate F+ continuously bombarding SiC surfaces with energies of 100 eV at different incident angles at 300 K. The simulated results show that the steady-state uptake of F atoms increases with increasing incident angle. With the steady-state etching established, a Si-C-F reactive layer is formed. It is found that the etching yield of Si is greater than that of C. In the F-containing reaction layer, the SiF species is dominant with incident angles less than 30°. For all incident angles, the CF species is dominant over CF2 and CF3. 展开更多
关键词 molecular dynamics methods plasma etching SIC
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The Implementation of the Surface Charging Effects in Three-Dimensional Simulations of SiO_(2) Etching Profile Evolution 被引量:1
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作者 Branislav Radjenovic Marija Radmilovic-Radjenovic 《Engineering(科研)》 2014年第1期1-6,共6页
Refined control of etched profile in microelectronic devices during plasma etching process is one of the most important tasks of front-end and back-end microelectronic devices manufacturing technologies. A comprehensi... Refined control of etched profile in microelectronic devices during plasma etching process is one of the most important tasks of front-end and back-end microelectronic devices manufacturing technologies. A comprehensive simulation of etching profile evolution requires knowledge of the etching rates at all the points of the profile surface during the etching process. Electrons do not contribute directly to the material removal, but they are the source, together with positive ions, of the profile charging that has many negative consequences on the final outcome of the process especially in the case of insulating material etching. The ability to simulate feature charging was added to the 3D level set profile evolution simulator described earlier. The ion and electron fluxes were computed along the feature using Monte Carlo method. The surface potential profiles and electric field for the entire feature were generated by solving Laplace equation using finite elements method. Calculations were performed in the case of simplified model of Ar+/CF4 non-equilibrium plasma etching of SiO2. 展开更多
关键词 Plasma etching Level Set method Profile Charging Finite Elements method
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直通孔扩散层结构对PEM电解槽性能影响研究
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作者 丁万龙 纪东骅 +3 位作者 崔国亮 赵明 骆泽威 范礼 《电源技术》 北大核心 2025年第2期403-407,共5页
为提升质子交换膜(PEM)电解槽的制氢效率并降低相应的能耗,通过调节阳极扩散层的孔径和孔隙率,采用化学蚀刻法制备了具有直通孔结构的扩散层。利用原位测试和电化学阻抗谱(EIS)技术,分析了不同扩散层结构对电解槽性能的影响。结果表明,... 为提升质子交换膜(PEM)电解槽的制氢效率并降低相应的能耗,通过调节阳极扩散层的孔径和孔隙率,采用化学蚀刻法制备了具有直通孔结构的扩散层。利用原位测试和电化学阻抗谱(EIS)技术,分析了不同扩散层结构对电解槽性能的影响。结果表明,在60℃的工作温度和1 A/cm^(2)的电流密度条件下,具有70%孔隙率和400μm孔径的扩散层展现出了最佳的制氢效率和最低的制氢能耗,此时电解槽的电压仅为1.642 V。这为阳极扩散层的制备及其结构优化提供了重要的理论基础和技术指导。 展开更多
关键词 PEM电解槽 制氢 扩散层 化学蚀刻法 电化学阻抗
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Dislocation Analysis for Large-sized Sapphire Single Crystal Grown by SAPMAC Method 被引量:2
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作者 汪桂根 张明福 +3 位作者 左洪波 许承海 赫晓东 韩杰才 《Chinese Journal of Structural Chemistry》 SCIE CAS CSCD 北大核心 2007年第11期1332-1336,共5页
In this paper, large-sized sapphire (Φ230×210 mm, 27.5 kg) was grown by SAPMAC method (sapphire growth technique with micro-pulling and shoulder-expanding at the cooled center). Dislocation peculiarity in la... In this paper, large-sized sapphire (Φ230×210 mm, 27.5 kg) was grown by SAPMAC method (sapphire growth technique with micro-pulling and shoulder-expanding at the cooled center). Dislocation peculiarity in large sapphire boule (0001) basal plane was investigated by chemical etchiing, scanning electron microscopy and X-ray topography method. The triangular dislocation etch pit measured is 7.6× 10^1-8.0×10^2 cm^2, in which relative high-density dislocations were generated at both initial and final stages of crystal growth. The analysis of single-crystal X-ray topography shows that there are no apparent sub-grain boundaries; the dislocation lines are isolated and straight. Finally, the origins of low-density dislocation in sapphire crystal are discussed by numerical analysis method. 展开更多
关键词 SAPPHIRE DISLOCATION chemical etching X-ray topography SAPMAC method
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Studies on the Properties of ZnO Crystal Plane Grown by the Innovated Hydrothermal Method
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作者 王永好 陈达贵 +4 位作者 李伟 黄嘉魁 王国红 林璋 黄丰 《Chinese Journal of Structural Chemistry》 SCIE CAS CSCD 北大核心 2008年第4期399-403,共5页
ZnO single crystals were grown by the innovated hydrothermal method. The crystal surfaces were polished, and then studied by atom force microscope (AFM) and wet-chemical etching (WCE). It was found that the Zn pol... ZnO single crystals were grown by the innovated hydrothermal method. The crystal surfaces were polished, and then studied by atom force microscope (AFM) and wet-chemical etching (WCE). It was found that the Zn polar plane was smoother than O polar plane under the same polishing conditions. The etch pit density of Zn polar plane is 4.3×10^3 cm^-2, which is consistent with the previous report, while the density of etch pit of O polar plane is more than 103cm^-2. After annealing treatment, the density of etch pit of Zn plane reduces to 5.8×102 cm^2 and is superior to the current report. This investigation reveals that the high quality ZnO single crystals with fine Zn polar plane can be obtained by the innovated hydrothermal method. 展开更多
关键词 ZnO crystal AFM etch pit density hydrothermal method surface topography
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Study Coefficient and Optical Application of KCI Single Crystal with Sn Impurity Growth on Czochralski Method under Visible Radiation
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作者 Feridoun Samavat Ebrahim Haji Ali Somayeh Solgi 《材料科学与工程(中英文A版)》 2012年第12期799-802,共4页
关键词 可见光辐射 光学系数 杂质 SN 提拉法 系数和 晶体生长 单晶
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MXene基电磁屏蔽复合材料的应用进展 被引量:1
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作者 陆云姝 唐婕 +1 位作者 龚宇蓉 李翔 《当代化工研究》 CAS 2024年第8期8-10,共3页
随着电子设备的快速发展和无线通信需求的急剧增加,电磁污染问题愈发严重。电磁屏蔽材料的研制可以很好地解决这类严峻的问题。MXene独特的层状结构、良好的导电性和优异的机械强度,使其在电磁屏蔽和生物医用领域均展现了极高的应用价... 随着电子设备的快速发展和无线通信需求的急剧增加,电磁污染问题愈发严重。电磁屏蔽材料的研制可以很好地解决这类严峻的问题。MXene独特的层状结构、良好的导电性和优异的机械强度,使其在电磁屏蔽和生物医用领域均展现了极高的应用价值。本文概述了MXene及复合材料的制备,以及在电磁屏蔽、乳腺癌治疗领域的应用进展。 展开更多
关键词 MXene 电磁屏蔽 乳腺癌 刻蚀方法 二维材料
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氨热法GaN单晶生长的位错密度演变研究
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作者 夏政辉 李腾坤 +6 位作者 任国强 解凯贺 卢文浩 李韶哲 郑树楠 高晓冬 徐科 《人工晶体学报》 CAS 北大核心 2024年第3期480-486,共7页
氮化镓单晶具有高击穿电压、直接带隙、高饱和电子漂移速率、良好的化学稳定性等特性,在光电子器件和大功率电子器件中有广泛的应用。然而异质外延氮化镓会产生高位错密度,限制了氮化镓基器件的性能发挥。本研究以HVPE-GaN为籽晶,采用... 氮化镓单晶具有高击穿电压、直接带隙、高饱和电子漂移速率、良好的化学稳定性等特性,在光电子器件和大功率电子器件中有广泛的应用。然而异质外延氮化镓会产生高位错密度,限制了氮化镓基器件的性能发挥。本研究以HVPE-GaN为籽晶,采用氨热法生长了氮化镓单晶,利用扫描电子显微镜(SEM),光学显微镜和湿法腐蚀研究了氨热法氮化镓单晶籽晶区至侧向生长区的位错演变。研究结果表明,侧向生长区的氮化镓单晶位错密度明显低于籽晶区,侧向生长超过25μm后,位错密度降低2个数量级。 展开更多
关键词 氮化镓单晶 氨热法 侧向生长 位错密度 腐蚀坑
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二维材料Ti_(3)C_(2)T_(x)的制备及其对锌离子电池电化学性能的影响
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作者 谷俊雷 翟朋辉 +1 位作者 柳勇 张万红 《电子元件与材料》 北大核心 2024年第11期1299-1305,共7页
针对锌金属负极枝晶生长以及与电解液之间的副反应问题,采用氢氟酸刻蚀MAX(Ti_(3)AlC_(2))得到具有“手风琴”层状结构的MXene(Ti_(3)C_(2)T_(x)),探究了不同刻蚀时间对材料形貌的影响。通过刮刀法将MXene涂布在锌箔表面构建了具有良好... 针对锌金属负极枝晶生长以及与电解液之间的副反应问题,采用氢氟酸刻蚀MAX(Ti_(3)AlC_(2))得到具有“手风琴”层状结构的MXene(Ti_(3)C_(2)T_(x)),探究了不同刻蚀时间对材料形貌的影响。通过刮刀法将MXene涂布在锌箔表面构建了具有良好机械强度和高导电性的保护层,并组装成纽扣电池进行了一系列材料表征和电化学测试。研究结果表明:不同刻蚀时间会严重影响材料的形貌,当刻蚀时间为48 h时,MXene@Zn‖Cu半电池可稳定循环400圈,库伦效率仍保持在99.6%以上。MXene@Zn‖MXene@Zn对称电池在1 mA·cm^(-2)的电流密度下可稳定循环400 h以上。在NH4 V4 O10(理论比容量为491 mAh·g^(-1))为正极的全电池测试中,3 A·g^(-1)的电流密度下,电池稳定循环600圈后,仍有接近200 mAh·g^(-1)的较高比容量。 展开更多
关键词 MXene 刻蚀 锌离子电池 刮刀法 人工SEI
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不同酸蚀模式与不同粘结剂在恒牙治疗中的应用比较
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作者 曾勇 李科 《粘接》 CAS 2024年第3期107-110,115,共5页
利用显微镜与万能拉伸试验机等设备,分析全酸蚀方法、自酸蚀方法、Gluma磷酸酸蚀法的粘接系统,在年轻恒牙治疗中的粘接残余系数、粘接强度与封闭剂脱落率。结果证明,全酸蚀方法的粘接系统在年轻恒牙治疗时的封闭剂脱落率最小;自酸蚀方... 利用显微镜与万能拉伸试验机等设备,分析全酸蚀方法、自酸蚀方法、Gluma磷酸酸蚀法的粘接系统,在年轻恒牙治疗中的粘接残余系数、粘接强度与封闭剂脱落率。结果证明,全酸蚀方法的粘接系统在年轻恒牙治疗时的封闭剂脱落率最小;自酸蚀方法的粘接系统封闭效果最差。酸蚀时间对全酸蚀方法影响较大,缩短酸蚀时间,可提升年轻恒牙粘接强度。酸蚀时间对Gluma磷酸酸蚀法影响较小;酸蚀时间一致时,全酸蚀方法的粘接强度明显高于Gluma磷酸酸蚀法,说明全酸蚀方法的粘接系统在年轻恒牙治疗中的效果优于Gluma磷酸酸蚀法的粘接系统。酸蚀浓度对不同酸蚀方法的粘接系统在年轻恒压中治疗效果影响均较小;不同酸蚀浓度时,全酸蚀方法的粘接残余系数最高,粘接强度最强。 展开更多
关键词 酸蚀方法 粘接系统 年轻恒牙 自酸蚀 全酸蚀 酸蚀浓度
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六氟丁二烯的制备工艺研究进展 被引量:1
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作者 陈芳 夏秋阳 +2 位作者 王昊 朱建秀 杜晨峥 《有机氟工业》 CAS 2024年第1期23-27,共5页
六氟丁二烯因其刻蚀精准、绿色环保等优势而备受关注,成为新一代电子刻蚀气体的理想产品。目前已报道的六氟丁二烯制备路线复杂多样,以现有制备方法中涉及到的关键中间体为分类标准对当前主流制备工艺进行归纳,并对现阶段取得的进展展... 六氟丁二烯因其刻蚀精准、绿色环保等优势而备受关注,成为新一代电子刻蚀气体的理想产品。目前已报道的六氟丁二烯制备路线复杂多样,以现有制备方法中涉及到的关键中间体为分类标准对当前主流制备工艺进行归纳,并对现阶段取得的进展展开论述。在此基础上,总结主流制备工艺存在的问题并展望未来可行的技术研发方向。 展开更多
关键词 六氟丁二烯 制备工艺 电子气体 刻蚀 关键中间体
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基于电化学液膜法腐蚀制备STM钨探针的研究
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作者 马玉麟 丁召 +1 位作者 王一 郭祥 《贵州科学》 2024年第1期90-93,共4页
高质量的探针是保证扫描隧道显微镜(Scanning Tunneling Microscope,STM)4K分辨率的关键。为得到原子级别的探针,实验基于电化学腐蚀原理,使用垂直液膜法制备钨探针。在制备过程中通过控制变量法,研究了腐蚀电压、液膜下钨丝长度等参数... 高质量的探针是保证扫描隧道显微镜(Scanning Tunneling Microscope,STM)4K分辨率的关键。为得到原子级别的探针,实验基于电化学腐蚀原理,使用垂直液膜法制备钨探针。在制备过程中通过控制变量法,研究了腐蚀电压、液膜下钨丝长度等参数对探针质量的影响,实验发现,当使用2 mol/L的NaOH溶液作为液膜时,最佳腐蚀电压为5 V、最佳液膜下钨丝长度为4 mm。该研究为电化学液膜法腐蚀制备钨探针提供了参考依据。 展开更多
关键词 液膜法 钨探针 电化学腐蚀 STM
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氟离子选择电极法测定含铜蚀刻废液中氟含量方法探讨 被引量:1
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作者 彭义华 《化学研究与应用》 CAS 北大核心 2024年第2期361-366,共6页
准确测定含铜蚀刻废液中氟含量是含铜蚀刻废液中铜盐回收的关键,本文就含铜蚀刻废液中氟含量离子选择电极测定方法[1~3]进行探讨与验证。通过样品前处理与试验,离子选择电极一次标准加入法测定下限为0.9mg·L^(-1),离子选择电极标... 准确测定含铜蚀刻废液中氟含量是含铜蚀刻废液中铜盐回收的关键,本文就含铜蚀刻废液中氟含量离子选择电极测定方法[1~3]进行探讨与验证。通过样品前处理与试验,离子选择电极一次标准加入法测定下限为0.9mg·L^(-1),离子选择电极标准曲线法测定下限为1.2 mg·L^(-1);两种方法的相对标准偏差在1.2%~1.7%,两种方法的加标回收率在77%~102%,满足工程应用要求。 展开更多
关键词 含铜蚀刻废液 氟离子选择电极 铜离子络合剂选择 空白扣除方式 累积加标
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Na_(2)O-CaO-SiO_(2)平板玻璃减反射功能化研究
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作者 郝霞 王其琛 +4 位作者 符有杰 李军葛 赵会峰 姜宏 王卓 《硅酸盐通报》 CAS 北大核心 2024年第4期1366-1373,共8页
随着光伏产业的高速发展,与之配套使用的减反射玻璃重新进入了研究者们的视野。本文采用湿化学二步刻蚀法制备了具有减反射性能的Na_(2)O-CaO-SiO_(2)平板玻璃,采用分光光度计、扫描电子显微镜、原子力显微镜和X射线能谱仪等测试样品的... 随着光伏产业的高速发展,与之配套使用的减反射玻璃重新进入了研究者们的视野。本文采用湿化学二步刻蚀法制备了具有减反射性能的Na_(2)O-CaO-SiO_(2)平板玻璃,采用分光光度计、扫描电子显微镜、原子力显微镜和X射线能谱仪等测试样品的透过率、表面形貌和断面膜层厚度、表面化学成分、耐酸性和硬度,研究了反应温度和反应时间、玻璃膜层结构与透过率的关系。通过使用弱碱性的混合盐溶液对Na_(2)O-CaO-SiO_(2)玻璃表面进行化学刻蚀,使玻璃表面Si—O键断裂,在玻璃表面形成纳米膜层结构,当膜层厚度达到一定厚度时,一定波长的光在玻璃表面发生相消干涉,透过率最高可达到97.8%,刻蚀前后玻璃成分基本无变化,铅笔硬度达到3H。 展开更多
关键词 减反射玻璃 透过率 Na_(2)O-CaO-SiO_(2)平板玻璃 湿化学二步刻蚀法 表面微裂纹 纳米孔
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