The group Ⅲ nitrides are an important class of materials with aplications in UV and visible optoelectronics,high temperature electronics,cold cathodes and solar blind detectors.In recent years,with the realisation of...The group Ⅲ nitrides are an important class of materials with aplications in UV and visible optoelectronics,high temperature electronics,cold cathodes and solar blind detectors.In recent years,with the realisation of nitride based LEDs,the use of GaN IED has the potential to compete with 1raditional filament and discharge lamps,for the provision of white lighting,and there has been an explosion of interest in the MOCVD growth of GaN based materials with an increasing focus on large area multiwafer reactors and wafer uniforrmity.This paper will review the design philosophy and characteristics of close-coupled showerhead reactors,relating these to the requirements of group Ⅲ-nitride growth,and will present a selection of data resulting from the operation of such equipment.These results suggest that the close coupled showerhead style of reactor is very suitable for the growth of GaN based structures in both research and production environments.展开更多
We have developed a superior solar-blind ultraviolet （UV） photocathode with an AlxGa1_xrN photocathode （x ～ 0.45） in semi-transparent mode, and assessed spectra radiant sensitivity related to practical use. Betbr...We have developed a superior solar-blind ultraviolet （UV） photocathode with an AlxGa1_xrN photocathode （x ～ 0.45） in semi-transparent mode, and assessed spectra radiant sensitivity related to practical use. Betbre being grown over a basal plane sapphire substrate by low-pressure metal organic chemical vapor deposition （MOCVD）, a reasonable design was made to the photocathode epitaxy structure, focusing on the AlxGa1_xN： Mg active layer, then followed by a comprehen- sive analysis of the structural and optical characterization. The spectra radiant sensitivity is peaked of 41.395 mA/W at wavelength 257 nm and then decreases by about 3 to 4 decades at 400 nm demonstrating the ability of this photocathode for solar-blind application prospects.展开更多
The determination of the elements of groups ⅢA and ⅣA by means of microwave plasma torch atomic emission spectrometry(MPT AES) was studied systematically. Sample solutions were introduced into the plasma with a pn...The determination of the elements of groups ⅢA and ⅣA by means of microwave plasma torch atomic emission spectrometry(MPT AES) was studied systematically. Sample solutions were introduced into the plasma with a pneumatic nebulizer in continuous sampling mode and flow injection (FI) mode. The emission characteristics of these elements were investigated in details, and the basic data obtained are very important to the development of MPT AES. The analytical performances were examined. For most elements, the detection limits obtained by this method were principally the same as those obtained by inductively coupled plasma atomic emission spectrometry (ICP AES).展开更多
采用光荧光和阴极荧光方法 ,对 Ga N外延层中的黄色和蓝色发光进行测量分析 ;同时 ,采用原子力显微镜、扫描电镜及其能谱测量外延层中的缺陷。结果表明 ,黄色和蓝色发光与残留杂质有关。采用第一原理计算结果显示 ,残留 C、O杂质、本征...采用光荧光和阴极荧光方法 ,对 Ga N外延层中的黄色和蓝色发光进行测量分析 ;同时 ,采用原子力显微镜、扫描电镜及其能谱测量外延层中的缺陷。结果表明 ,黄色和蓝色发光与残留杂质有关。采用第一原理计算结果显示 ,残留 C、O杂质、本征缺陷等是黄色和蓝色的可能物理起源。采用原子力显微镜、扫描电镜、透射电镜及其能谱对 Ga N/Al Ga N异质结中的纳米管进行观测 ,了解了纳米管的形貌。结果表明 ,构成纳米管的小面可能是外延过程中表面吸附引起的 ;计算结果显示 ,纳米管形貌变化与 Ga N/Al Ga N界面处晶格失配应力有关。采用透射电镜观察外延层中沉积物及其周围位错的结构表明 。展开更多
文摘The group Ⅲ nitrides are an important class of materials with aplications in UV and visible optoelectronics,high temperature electronics,cold cathodes and solar blind detectors.In recent years,with the realisation of nitride based LEDs,the use of GaN IED has the potential to compete with 1raditional filament and discharge lamps,for the provision of white lighting,and there has been an explosion of interest in the MOCVD growth of GaN based materials with an increasing focus on large area multiwafer reactors and wafer uniforrmity.This paper will review the design philosophy and characteristics of close-coupled showerhead reactors,relating these to the requirements of group Ⅲ-nitride growth,and will present a selection of data resulting from the operation of such equipment.These results suggest that the close coupled showerhead style of reactor is very suitable for the growth of GaN based structures in both research and production environments.
基金supported by the National Natural Science Foundation of China(Grant No.10974015)the National Defense Pre-Research Foundation of China(Grant No.9140C380502150C38002)
文摘We have developed a superior solar-blind ultraviolet （UV） photocathode with an AlxGa1_xrN photocathode （x ～ 0.45） in semi-transparent mode, and assessed spectra radiant sensitivity related to practical use. Betbre being grown over a basal plane sapphire substrate by low-pressure metal organic chemical vapor deposition （MOCVD）, a reasonable design was made to the photocathode epitaxy structure, focusing on the AlxGa1_xN： Mg active layer, then followed by a comprehen- sive analysis of the structural and optical characterization. The spectra radiant sensitivity is peaked of 41.395 mA/W at wavelength 257 nm and then decreases by about 3 to 4 decades at 400 nm demonstrating the ability of this photocathode for solar-blind application prospects.
文摘The determination of the elements of groups ⅢA and ⅣA by means of microwave plasma torch atomic emission spectrometry(MPT AES) was studied systematically. Sample solutions were introduced into the plasma with a pneumatic nebulizer in continuous sampling mode and flow injection (FI) mode. The emission characteristics of these elements were investigated in details, and the basic data obtained are very important to the development of MPT AES. The analytical performances were examined. For most elements, the detection limits obtained by this method were principally the same as those obtained by inductively coupled plasma atomic emission spectrometry (ICP AES).
文摘采用光荧光和阴极荧光方法 ,对 Ga N外延层中的黄色和蓝色发光进行测量分析 ;同时 ,采用原子力显微镜、扫描电镜及其能谱测量外延层中的缺陷。结果表明 ,黄色和蓝色发光与残留杂质有关。采用第一原理计算结果显示 ,残留 C、O杂质、本征缺陷等是黄色和蓝色的可能物理起源。采用原子力显微镜、扫描电镜、透射电镜及其能谱对 Ga N/Al Ga N异质结中的纳米管进行观测 ,了解了纳米管的形貌。结果表明 ,构成纳米管的小面可能是外延过程中表面吸附引起的 ;计算结果显示 ,纳米管形貌变化与 Ga N/Al Ga N界面处晶格失配应力有关。采用透射电镜观察外延层中沉积物及其周围位错的结构表明 。
