Optical waveguides in silica-on-silicon are one of the key elements in optical communications.The processes of deep etching silica waveguides using resist and metal masks in RIE plasma are investigated.The etching res...Optical waveguides in silica-on-silicon are one of the key elements in optical communications.The processes of deep etching silica waveguides using resist and metal masks in RIE plasma are investigated.The etching responses,including etching rate and selectivity as functions of variation of parameters,are modeled with a 3D neural network.A novel resist/metal combined mask that can overcome the single-layer masks’ limitations is developed for enhancing the waveguides deep etching and low-loss optical waveguides are fabricated at last.展开更多
A new technology for fabrication of silica on silicon arrayed waveguide grating (AWG) based on deep etching and thermal oxidation is presented.Using this method,a silicon layer is remained at the side of waveguide.The...A new technology for fabrication of silica on silicon arrayed waveguide grating (AWG) based on deep etching and thermal oxidation is presented.Using this method,a silicon layer is remained at the side of waveguide.The stress distribution and effective refractive index of waveguide fabricated by this approach are calculated using finite element and finite difference beam propagation method,respectively.The results of these studies indicate that the stress of silica on silicon optical waveguide can be matched in parallel and vertical direction and AWG polarization dependent wavelength (PDλ) can be reduced effectively due to side-silicon layer.展开更多
A flat response silica-based arrayed waveguide grating （AWG） with 10-channels and 0.8 nm （100 GHz） channel spacing has been designed and fabricated using multimode interferometer （MMI） at the end of input wavegu...A flat response silica-based arrayed waveguide grating （AWG） with 10-channels and 0.8 nm （100 GHz） channel spacing has been designed and fabricated using multimode interferometer （MMI） at the end of input waveguide. Proper width of MMI is theoretically optimized using beam propagation method （BPM）. An AWG with a 1 6 um width MMI is fabricated experimentally. The measurement results show that the 3 clB bandwidth is 0.62 nm,insertion loss （IS） ranges from 5.2 dB to 7.5 dB,and the crosstalk is less than - 20 dB. The 3dB bandwidth,channel numbers and channel spacing of the AWG agree well with the simulation values.展开更多
Silica-based 71-channle AWGs with 0.4 nm （50 GHz） channel spacing at 1. 5445 μm have been designed and fabricated by using silica-based waveguide. Theoretical simulation and experimental results are given and compa...Silica-based 71-channle AWGs with 0.4 nm （50 GHz） channel spacing at 1. 5445 μm have been designed and fabricated by using silica-based waveguide. Theoretical simulation and experimental results are given and compared. The test results show that the fiber-to-fiber insertion loss ranges from 3.5 dB to 7.1 dB for central and peripheral output ports, respectively, the total crosstalk level is better than -32 dB, 3 dB bandwidth is 25 GHz and polarization dependence Ioss（PDL） within 3 dB bandwidth is less than 0.5 dB, which agrees well with the simulation results.展开更多
Inorganic silica-titania thin films with thicknesses 150 nm-200 nm are deposited on high purity and polished silicon wafer and silica glass substrates by sol-gel dipping process and are patterned by capillary force li...Inorganic silica-titania thin films with thicknesses 150 nm-200 nm are deposited on high purity and polished silicon wafer and silica glass substrates by sol-gel dipping process and are patterned by capillary force lithography technique. Subsequently grating structure is embossed in green stage. The patterned gel films are subjected to stepwise heat treatment to 500 ℃ and above in pure oxygen atmosphere in order to achieve major conversion of mixed-gel to oxide optical films which are characterized by Ellipsometry, Fourier transform infrared spectroscopy （FTIR） and atomic force microscopy （AFM） to optimize the fabrication parameters and to get perfectly matched film. Removal of organics and formation of perfectly inorganic silica-titania network at optimized heat treatment in controlled environment are ensured by FTIR spectral study. The difference in refractive indices between the substrate and coated film as developed waveguides for operating wavelength show the planar waveguide behavior of the films. calculated theoretically matches exactly with the （632.8 nm） and the measured optical properties展开更多
文摘Optical waveguides in silica-on-silicon are one of the key elements in optical communications.The processes of deep etching silica waveguides using resist and metal masks in RIE plasma are investigated.The etching responses,including etching rate and selectivity as functions of variation of parameters,are modeled with a 3D neural network.A novel resist/metal combined mask that can overcome the single-layer masks’ limitations is developed for enhancing the waveguides deep etching and low-loss optical waveguides are fabricated at last.
文摘A new technology for fabrication of silica on silicon arrayed waveguide grating (AWG) based on deep etching and thermal oxidation is presented.Using this method,a silicon layer is remained at the side of waveguide.The stress distribution and effective refractive index of waveguide fabricated by this approach are calculated using finite element and finite difference beam propagation method,respectively.The results of these studies indicate that the stress of silica on silicon optical waveguide can be matched in parallel and vertical direction and AWG polarization dependent wavelength (PDλ) can be reduced effectively due to side-silicon layer.
基金Supported by the National Natural Science Foundation of China(No.60477035 ,No.60507006) and The Ministry of Science and Technology "973" Plan (No.G2000036602)
文摘A flat response silica-based arrayed waveguide grating （AWG） with 10-channels and 0.8 nm （100 GHz） channel spacing has been designed and fabricated using multimode interferometer （MMI） at the end of input waveguide. Proper width of MMI is theoretically optimized using beam propagation method （BPM）. An AWG with a 1 6 um width MMI is fabricated experimentally. The measurement results show that the 3 clB bandwidth is 0.62 nm,insertion loss （IS） ranges from 5.2 dB to 7.5 dB,and the crosstalk is less than - 20 dB. The 3dB bandwidth,channel numbers and channel spacing of the AWG agree well with the simulation values.
文摘Silica-based 71-channle AWGs with 0.4 nm （50 GHz） channel spacing at 1. 5445 μm have been designed and fabricated by using silica-based waveguide. Theoretical simulation and experimental results are given and compared. The test results show that the fiber-to-fiber insertion loss ranges from 3.5 dB to 7.1 dB for central and peripheral output ports, respectively, the total crosstalk level is better than -32 dB, 3 dB bandwidth is 25 GHz and polarization dependence Ioss（PDL） within 3 dB bandwidth is less than 0.5 dB, which agrees well with the simulation results.
文摘Inorganic silica-titania thin films with thicknesses 150 nm-200 nm are deposited on high purity and polished silicon wafer and silica glass substrates by sol-gel dipping process and are patterned by capillary force lithography technique. Subsequently grating structure is embossed in green stage. The patterned gel films are subjected to stepwise heat treatment to 500 ℃ and above in pure oxygen atmosphere in order to achieve major conversion of mixed-gel to oxide optical films which are characterized by Ellipsometry, Fourier transform infrared spectroscopy （FTIR） and atomic force microscopy （AFM） to optimize the fabrication parameters and to get perfectly matched film. Removal of organics and formation of perfectly inorganic silica-titania network at optimized heat treatment in controlled environment are ensured by FTIR spectral study. The difference in refractive indices between the substrate and coated film as developed waveguides for operating wavelength show the planar waveguide behavior of the films. calculated theoretically matches exactly with the （632.8 nm） and the measured optical properties
