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Ni_(59)Al_(22)V_(19)中熵合金异相界面结构及沉淀机制的微扩散相场法研究 被引量:1
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作者 代宁波 赵宇宏 《航空材料学报》 CAS CSCD 北大核心 2022年第6期72-80,共9页
基于单晶格点原子占位几率描述相变过程的微扩散相场模型,从原子尺度上研究了Ni_(59)Al_(22)V_(19)中熵合金的异相界面结构与相变过程中合金微观组织演化。结果表明:Ni_(59)Al_(22)V_(19)中熵合金沉淀初期有L_(12)和少量的DO_(22)、L_(... 基于单晶格点原子占位几率描述相变过程的微扩散相场模型,从原子尺度上研究了Ni_(59)Al_(22)V_(19)中熵合金的异相界面结构与相变过程中合金微观组织演化。结果表明:Ni_(59)Al_(22)V_(19)中熵合金沉淀初期有L_(12)和少量的DO_(22)、L_(10)有序相的析出,随着时效过程进行,形成L_(12)与DO_(22)相并存的状态;在时效过程中出现了4种异相界面结构;相变初期,以A类界面结构为主,随着有序相的生长与分解,A类界面结构数量减少而D类结构数量增多;沉淀过程中有序畴界为L_(12)相生长提供Al原子,最终合金平衡体系形成;沉淀过程中γ′相的沉淀机制是等成分有序化和失稳分解机制,θ相的沉淀机制为失稳分解机制;除此之外,Ni_(59)Al_(22)V_(19)中熵合金孕育期随温度升高而时效时间变久;Ni-Al第一近邻原子间相互作用势随长程序参数增加而升高且与温度成正比关系。 展开更多
关键词 Ni_(59)Al_(22)V_(19)中熵合金 异相界面结构 微扩散相场法 有序相沉淀机制
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Interface of transition metal oxides at the atomic scale 被引量:1
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作者 Tong-Tong Shang Xin-Yu Liu Lin Gu 《Science China(Physics,Mechanics & Astronomy)》 SCIE EI CAS CSCD 2016年第9期1-9,共9页
Remarkable phenomena arise at well-defined heterostructures, composed of transition metal oxides, which is absent in the bulk counterpart, providing us a paradigm for exploring the various electron correlation effects... Remarkable phenomena arise at well-defined heterostructures, composed of transition metal oxides, which is absent in the bulk counterpart, providing us a paradigm for exploring the various electron correlation effects. The functional properties of such heterostructures have attracted much attention in the microelectronic and renewable energy fields. Exotic and unexpected states of matter could arise from the reconstruction and coupling among lattice, charge, orbital and spin at the interfaces. Aberration-corrected scanning transmission electron microscopy (STEM) is a powerful tool to visualize the lattice structure and electronic structure at the atomic scale. In the present study some novel phenomena of oxide heterostructures at the atomic scale are summarized and pointed out from the perspective of electron microscopy. 展开更多
关键词 INTERFACE transition metal oxides STEM strong correlation
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Contracted interlayer distance in graphene/sapphire heterostructure
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作者 Shiro Entani Liubov Yu. Antipina +8 位作者 Pavel V. Avramov Manabu Ohtomo Yoshihiro Matsumoto Norie Hirao Iwao Shimoyama Hiroshi Naramoto Yuji Baba Pavel B. Sorokin Seiji Sakai 《Nano Research》 SCIE EI CAS CSCD 2015年第5期1535-1545,共11页
Direct growth of graphene on insulators is expected to yield significant improvements in performance of graphene-based electronic and spintronic devices. In this study, we successfully reveal the atomic arrangement an... Direct growth of graphene on insulators is expected to yield significant improvements in performance of graphene-based electronic and spintronic devices. In this study, we successfully reveal the atomic arrangement and electronic properties of a coherent heterostructure of single-layer graphene and α-Al2O3(0001). The analysis of the atomic arrangement of single-layer graphene on α-Al2O3(0001) revealed an apparentcontradiction. The in-plane analysis shows that single-layer graphene grows not in a single-crystalline epitaxial manner, but rather in polycrystalline form, with two strongly pronounced preferred orientations. This suggests relatively weak interfacial interactions are operative. However, we demonstrate that unusually strong physical interactions between graphene and α-Al2O3(0001) exist, as evidenced by the small separation between the graphene and the α-Al2O3(0001) surface. The interfacial interaction is shown to be dominated by the electrostatic forces involved in the graphene n-system and the unsaturated electrons of the topmost O layer of α-Al2O3(0001), rather than the van der Waals interactions. Such features causes graphene hole doping and enable the graphene to slide on the α-Al2O3(0001) surface with only a small energy barrier despite the strong interfacial interactions. 展开更多
关键词 GRAPHENE SAPPHIRE chemical vapor deposition graphene/insulator interface
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