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Co-doped BaFe_(2)As_(2) Josephson junction fabricated with a focused helium ion beam 被引量:1
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作者 陈紫雯 张焱 +6 位作者 马平 徐中堂 李宇龙 王越 路建明 马衍伟 甘子钊 《Chinese Physics B》 SCIE EI CAS CSCD 2024年第4期181-186,共6页
Josephson junction plays a key role not only in studying the basic physics of unconventional iron-based superconductors but also in realizing practical application of thin-film based devices,therefore the preparation ... Josephson junction plays a key role not only in studying the basic physics of unconventional iron-based superconductors but also in realizing practical application of thin-film based devices,therefore the preparation of high-quality iron pnictide Josephson junctions is of great importance.In this work,we have successfully fabricated Josephson junctions from Co-doped BaFe_(2)As_(2)thin films using a direct junction fabrication technique which utilizes high energy focused helium ion beam(FHIB).The electrical transport properties were investigated for junctions fabricated with various He^(+)irradiation doses.The junctions show sharp superconducting transition around 24 K with a narrow transition width of 2.5 K,and a dose correlated foot-structure resistance which corresponds to the effective tuning of junction properties by He^(+)irradiation.Significant J_c suppression by more than two orders of magnitude can be achieved by increasing the He^(+)irradiation dose,which is advantageous for the realization of low noise ion pnictide thin film devices.Clear Shapiro steps are observed under 10 GHz microwave irradiation.The above results demonstrate the successful fabrication of high quality and controllable Co-doped BaFe_(2)As_(2)Josephson junction with high reproducibility using the FHIB technique,laying the foundation for future investigating the mechanism of iron-based superconductors,and also the further implementation in various superconducting electronic devices. 展开更多
关键词 focused helium ion beam Co doped BaFe_(2)As_(2) Josephson junction
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Half-integer Shapiro steps in MgB_(2) focused He ion beam Josephson junctions
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作者 殷大利 蔡欣炜 +5 位作者 徐铁权 孙瑞宁 韩颖 张焱 王越 甘子钊 《Chinese Physics B》 SCIE EI CAS CSCD 2024年第8期483-489,共7页
Half-integer microwave induced steps(Shapiro steps)have been observed in many different Josephson junction systems,which have attracted a lot of attention because they signify the deviation of current phase relation(C... Half-integer microwave induced steps(Shapiro steps)have been observed in many different Josephson junction systems,which have attracted a lot of attention because they signify the deviation of current phase relation(CPR)and uncover many unconventional physical properties.In this article,we first report the discovery of half-integer Shapiro steps in MgB_(2)focused He ion beam(He-FIB)Josephson junctions.The half-integer steps'dependence on microwave frequency,temperature,microwave power,and magnetic field is also analyzed.We find that the existence of half-integer steps can be controlled by the magnetic field periodically,which is similar to that of high temperature superconductor(HTS)grain boundary junctions,and the similarity of the microstructures between gain boundary junctions and He-FIB junctions is discussed.As a consequence,we mainly attribute the physical origin of half-integer steps in MgB_(2)He-FIB junctions to the model that a He-FIB junction is analogous to a parallel junctions'array.Our results show that He-FIB technology is a promising platform for researching CPR in junctions made of different superconductors. 展开更多
关键词 Josephson junction half-integer Shapiro steps MgB_(2) focused helium ion beam
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Annealing treatment of focused gallium ion beam processing of SERS gold substrate 被引量:2
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作者 Zhixiang Tao Wei Zhao +4 位作者 Shang Wang Boyu Zhao Rushuai Hua Ji Qin Zongwei Xu 《Nanotechnology and Precision Engineering》 CAS CSCD 2021年第4期37-44,共8页
Raman spectroscopy is a type of inelastic scattering spectroscopy that is widely used in determining and analyzing molecular structure.It also has a number of practical applications in evaluating food safety,medicine,... Raman spectroscopy is a type of inelastic scattering spectroscopy that is widely used in determining and analyzing molecular structure.It also has a number of practical applications in evaluating food safety,medicine,and forensics.The Raman spectral signal is weak,but the development of the surface-enhanced Raman scattering(SERS)technique has overcome this problem and led to further developments in Raman spectroscopy.This paper describes a fundamental study of the use of focused ion beam(FIB)direct writing for preparing gold substrates for SERS.Molecular dynamics and Monte Carlo simulation methods are used to investigate the damage induced by gallium ion implantation of a gold substrate.Based on characterization by x-ray photoelectron spectroscopy(XPS)and scanning electron microscopy,the mechanism by which ion implantation and annealing influence the damage induced by a gallium FIB is analyzed.After annealing at 350 XC,a mixture of metallic gallium,its oxide Ga2O3 conforming to the stoichiometric ratio,and its sub-stable oxide(Ga2Ox)in sub-stoichiometric ratio precipitated on the surface are detected by XPS.Annealing treatment can effectively reduce the effect of gallium ion implantation on a SERS substrate fabricated by FIB direct writing. 展开更多
关键词 Raman spectroscopy focused ion beam ANNEALING X-ray photoelectron spectroscopy
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High-Temperature Superconducting YBa_(2)Cu_(3)O_(7-δ)Josephson Junction Fabricated with a Focused Helium Ion Beam 被引量:2
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作者 Ziwen Chen Yulong Li +9 位作者 Rui Zhu Jun Xu Tiequan Xu Dali Yin Xinwei Cai Yue Wang Jianming Lu Yan Zhang * and Ping Ma 《Chinese Physics Letters》 SCIE EI CAS CSCD 2022年第7期87-92,共6页
As a newly developed method for fabricating Josephson junctions,a focused helium ion beam has the advantage of producing reliable and reproducible junctions.We fabricated Josephson junctions with a focused helium ion ... As a newly developed method for fabricating Josephson junctions,a focused helium ion beam has the advantage of producing reliable and reproducible junctions.We fabricated Josephson junctions with a focused helium ion beam on our 50 nm YBa_(2)Cu_(3)O_(7-δ)(YBCO)thin films.We focused on the junction with irradiation doses ranging from 100 to 300 ions/nm and demonstrated that the junction barrier can be modulated by the ion dose and that within this dose range,the junctions behave like superconductor–normal conductor–superconductor junctions.The measurements of the I–V characteristics,Fraunhofer diffraction pattern,and Shapiro steps of the junctions clearly show AC and DC Josephson effects.Our findings demonstrate high reproducibility of junction fabrication using a focused helium ion beam and suggest that commercial devices based on this nanotechnology could operate at liquid nitrogen temperatures. 展开更多
关键词 Josephson Junction Fabricated with a focused Helium ion beam High-Temperature Superconducting YBa_(2)Cu_(3)O
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Ordered SrTiO_3 Nanoripples Induced by Focused Ion Beam
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作者 Jiang Wu Gang Chen +4 位作者 Zhaoquan Zeng Shibin Li Xingliang Xu Zhiming M.Wang Gregory J.Salamo 《Nano-Micro Letters》 SCIE EI CAS 2012年第4期243-246,共4页
Ordered nanoripples on the niobium-doped SrTiO_3 surfaces were fabricated through focused ion beam bombardment. The surface morphology of the SrTiO_3 nanoripples was characterized using in situ focused ion beam/scanni... Ordered nanoripples on the niobium-doped SrTiO_3 surfaces were fabricated through focused ion beam bombardment. The surface morphology of the SrTiO_3 nanoripples was characterized using in situ focused ion beam/scanning electron microscopy. The well-aligned SrTiO_3 nanostructures were obtained under optimized ion irradiation conditions. The characteristic wavelength was measured as about 210 nm for different ion beam currents. The relationship between the ion irradiation time and current and SrTiO_3 surface morphology was analyzed. The presented method will be an effective supplement for fabrication of SrTiO_3 nanostructures that can be used for ferroelectric and electronic applications. 展开更多
关键词 SRTIO3 focused ion beam nanoripple SELF-ASSEMBLY
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Three-dimensional vertical ZnO transistors with suspended top electrodes fabricated by focused ion beam technology
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作者 Chi Sun Linyuan Zhao +4 位作者 Tingting Hao Renrong Liang Haitao Ye Junjie Li Changzhi Gu 《Chinese Physics B》 SCIE EI CAS CSCD 2022年第1期492-496,共5页
Three-dimensional(3D)vertical architecture transistors represent an important technological pursuit,which have distinct advantages in device integration density,operation speed,and power consumption.However,the fabric... Three-dimensional(3D)vertical architecture transistors represent an important technological pursuit,which have distinct advantages in device integration density,operation speed,and power consumption.However,the fabrication processes of such 3D devices are complex,especially in the interconnection of electrodes.In this paper,we present a novel method which combines suspended electrodes and focused ion beam(FIB)technology to greatly simplify the electrodes interconnection in 3D devices.Based on this method,we fabricate 3D vertical core-double shell structure transistors with ZnO channel and Al_(2)O_(3) gate-oxide both grown by atomic layer deposition.Suspended top electrodes of vertical architecture could be directly connected to planar electrodes by FIB deposited Pt nanowires,which avoid cumbersome steps in the traditional 3D structure fabrication technology.Both single pillar and arrays devices show well behaved transfer characteristics with an Ion/Ioff current ratio greater than 106 and a low threshold voltage around 0 V.The ON-current of the 2×2 pillars vertical channel transistor was 1.2μA at the gate voltage of 3 V and drain voltage of 2 V,which can be also improved by increasing the number of pillars.Our method for fabricating vertical architecture transistors can be promising for device applications with high integration density and low power consumption. 展开更多
关键词 three-dimensional(3D)vertical ZnO transistor focused ion beam(fib) suspended electrodes the electrical inter-connection in 3D devices
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聚焦离子束(Focused Ion Beam)原理与其在半导体工业之应用 被引量:2
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作者 余维斌 黄坤火 柯大华 《电子工业专用设备》 2003年第5期70-72,共3页
聚焦离子束被广泛应用于芯片电路修改、研磨、沉积和二次电子/离子成像。FIB对于新原型电路设计的修改以及离子间交互作用的基础研究具有独特之性能。使用极细的聚焦离子束,FIB技术可以进行比从前更加精确的产品失效分析。操作者可以快... 聚焦离子束被广泛应用于芯片电路修改、研磨、沉积和二次电子/离子成像。FIB对于新原型电路设计的修改以及离子间交互作用的基础研究具有独特之性能。使用极细的聚焦离子束,FIB技术可以进行比从前更加精确的产品失效分析。操作者可以快速地、选择性地去除绝缘层或金属层,以便进行集成电路下层信号的点针探测或材质分析。集成电路的断面切割还可以达到亚微米的精度。 展开更多
关键词 聚焦离子束 植入 点针 材质分析 断面
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Monte Carlo Si mulation of Damage Depth in Focused Ion Beam Milling Si_3N_4 Thin Film
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作者 TAN Yong-wen XIE Xue-bing +3 位作者 Jack Zhou XU Tian-wei YANG Wei-guo YANG Hai 《Semiconductor Photonics and Technology》 CAS 2007年第4期272-275,288,共5页
The damage properties of Focused Ion Beam(FIB) milling Si3N4 thin film are investigated by the detailed analyzing images of nanoholes and simulation of Monte Carlo. The damage depth in the Si3N4 thin film for two diff... The damage properties of Focused Ion Beam(FIB) milling Si3N4 thin film are investigated by the detailed analyzing images of nanoholes and simulation of Monte Carlo. The damage depth in the Si3N4 thin film for two different ion species(Gallium and Arsenic) under various parameters(ion energy, angle of incidence) are investigated by Monte Carlo method. The simulations show the damage depth increases with the increasing ion energy, the damage depth is dependent on the angle of incident ion, the curves of the damage depth for Ga ion and As ion at 30 keV nearly superpose, while the damage depth for Ga with 90 keV ion is more than that for As ion with the same energy. 展开更多
关键词 monte carlo method focused ion beam effects damage depth
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Control of beam halo-chaos by sample function 被引量:1
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作者 白龙 张荣 +2 位作者 翁甲强 罗晓曙 方锦清 《Chinese Physics B》 SCIE EI CAS CSCD 2006年第6期1226-1230,共5页
The K-V beam through an axisymmetric uniform-focusing channel is studied using the particle-core model. The beam halo-chaos is found, and a sample function controller is proposed based on mechanism of halo formation a... The K-V beam through an axisymmetric uniform-focusing channel is studied using the particle-core model. The beam halo-chaos is found, and a sample function controller is proposed based on mechanism of halo formation and strategy of controlling halo-chaos. We perform multiparticle simulation to control the halo by using the sample function controller. The numerical results show that our control method is effective. We also find that the radial ion density changes when the ion beam is in the channel: not only can the halo-chaos and its regeneration be eliminated by using the sample function control method, but also the density uniformity can be found at the beam's centre as long as an appropriate control method is chosen. 展开更多
关键词 beam halo-chaos sample function radial ion density uniform-focusing channel
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基于MD模拟的低能FIB辐照金刚石靶材亚表层损伤形成机理研究 被引量:1
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作者 李啸 王全龙 +2 位作者 杨宇 邱蓬勃 武美萍 《轻工机械》 CAS 2024年第4期25-35,共11页
聚焦离子束(focused Ion beam,FIB)作为一种用于金刚石微铣刀的特种加工方式,其引发的损伤程度直接关联到刀具的加工性能和寿命。课题组采用LAMMPS软件进行分子动力学(Molecular Dynamics,MD)模拟,结合SRIM软件的分析结果,探究单晶金刚... 聚焦离子束(focused Ion beam,FIB)作为一种用于金刚石微铣刀的特种加工方式,其引发的损伤程度直接关联到刀具的加工性能和寿命。课题组采用LAMMPS软件进行分子动力学(Molecular Dynamics,MD)模拟,结合SRIM软件的分析结果,探究单晶金刚石亚表层损伤的形成机理和入射离子能量对损伤深度和范围的影响。模拟结果表明:随着入射离子能量的提升,离子束在材料内的渗透深度及引起的非晶层和点缺陷损伤均有所增加;进一步的研究发现损伤形成过程中材料局部温度的上升可能诱发自退火现象,且与离子入射能量成正比,该现象对于理解聚焦离子束加工引起的损伤有着至关重要的意义;而势能的变化与损伤形成之间的显著对应关系揭示了第一邻近原子的势能明显高于第二邻近原子,进而高于Other类型原子,这一发现有助于深入理解损伤形成的微观过程。因此,精确控制入射能量是实现金刚石材料高精度聚焦离子束加工的关键,且对自退火效应和势能变化的研究对损伤监控与控制同样重要。 展开更多
关键词 金刚石微铣刀 聚焦离子束 分子动力学 亚表层损伤 SRIM软件
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聚集离子束扫描电镜(FIB-SEM)在页岩纳米级孔隙结构研究中的应用 被引量:42
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作者 马勇 钟宁宁 +2 位作者 黄小艳 郭州平 姚立鹏 《电子显微学报》 CAS CSCD 2014年第3期251-256,共6页
页岩中大量发育的纳米级孔隙组成了页岩气储集的主要空间。聚集离子束扫描电镜(FIB-SEM)通过对页岩样品的连续切割和成像,能够在纳米尺度上三维重建页岩的空间分布。依据不同岩石组分灰度值的差异,可以将页岩内的孔隙、有机质、黄铁矿... 页岩中大量发育的纳米级孔隙组成了页岩气储集的主要空间。聚集离子束扫描电镜(FIB-SEM)通过对页岩样品的连续切割和成像,能够在纳米尺度上三维重建页岩的空间分布。依据不同岩石组分灰度值的差异,可以将页岩内的孔隙、有机质、黄铁矿等分割提取出来,不仅可以三维展示其空间分布形态,还可以对孔隙的分布特征和孔隙度等参数进行定量计算。聚集离子束扫描电镜在页岩纳米孔隙中的应用,将给页岩微观结构的深入研究提供新的研究手段。 展开更多
关键词 页岩气 聚焦离子束扫描电镜 fib-SEM 页岩纳米孔隙 三维重构
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高性能聚焦离子束(FIB)系统及其在材料科学领域的应用 被引量:9
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作者 周伟敏 吴国英 《实验室研究与探索》 CAS 2004年第9期19-20,52,共3页
采用液态镓作为离子源的FIB系统在材料科学研究领域可以起非常重要的作用。离子束聚焦于样品表面,在不同大小、束流及通入不同辅助气体的情况下,可分别实现图形刻蚀、绝缘和金属膜的沉淀,扫描离子成像等功能。该系统有三大用途:形貌观察... 采用液态镓作为离子源的FIB系统在材料科学研究领域可以起非常重要的作用。离子束聚焦于样品表面,在不同大小、束流及通入不同辅助气体的情况下,可分别实现图形刻蚀、绝缘和金属膜的沉淀,扫描离子成像等功能。该系统有三大用途:形貌观察,分辨率高达5nm;微刻蚀以及微沉淀。本文介绍了FIB技术的应用。 展开更多
关键词 聚焦离子束显微镜(fib) 透射电子显微分析(TEM) 材料科学
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聚焦离子束(FIB)刻蚀在光电子器件方面的应用 被引量:3
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作者 毕建华 陆家和 《真空科学与技术》 CSCD 1994年第4期299-306,共8页
聚焦离子束无掩模微细加工技术逐渐引起人们的兴趣,它包括聚焦离子束无掩模刻蚀、注入、往积、光刻等。聚焦离子束刻蚀能在半导体激光器材料上加工得到具有光学精度的表面。首先论述聚焦离子束刻蚀的特点,然后概括说明目前它在光电子... 聚焦离子束无掩模微细加工技术逐渐引起人们的兴趣,它包括聚焦离子束无掩模刻蚀、注入、往积、光刻等。聚焦离子束刻蚀能在半导体激光器材料上加工得到具有光学精度的表面。首先论述聚焦离子束刻蚀的特点,然后概括说明目前它在光电子器件方面的若干应用。 展开更多
关键词 聚焦离子束 无掩模刻蚀 光电子器件
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FIB加工、扫描及透射电子显微镜相结合的复杂合金相层状组织表征 被引量:8
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作者 周玲玲 孙威 《电子显微学报》 CAS CSCD 北大核心 2018年第6期590-595,共6页
扫描电子显微镜(SEM)与聚焦离子束(FIB)可集成为双束系统,实现微区形貌观察与样品加工一体化,同时也可实现截面薄样品的定位提取。利用该技术并结合透射电镜(TEM)技术研究了Al-Pd-Fe复杂合金系铸态组织中层片结构的构成与分布特征。结... 扫描电子显微镜(SEM)与聚焦离子束(FIB)可集成为双束系统,实现微区形貌观察与样品加工一体化,同时也可实现截面薄样品的定位提取。利用该技术并结合透射电镜(TEM)技术研究了Al-Pd-Fe复杂合金系铸态组织中层片结构的构成与分布特征。结果表明,铸态Al_(75)Pd_(15)Fe_(10)合金中的层片组织由M-Al_(13)Fe_4相与准晶相构成。通过对比发现,相同层片组织在背散射电子像与透射电镜观察下呈现出明显不同的分布特征。结合扫描与透射电子显微学成像原理,阐明了SEM和TEM两种表征方式产生不同结果的原因,指出了通过SEM,FIB以及TEM相结合对表征微细多相混合组织真实三维空间分布特征的必要性和有效性。 展开更多
关键词 复杂合金相 片层组织 背散射电子成像 聚焦离子束 透射电子显微镜
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基于聚焦离子束切割制样的热镀锌汽车钢板漏镀缺陷结构表征与成因分析
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作者 韦浪浪 田秀刚 +4 位作者 梁健 苗斌 杨峰 李扬 郑士建 《材料导报》 北大核心 2025年第4期172-178,共7页
漏镀缺陷易在先进高强汽车钢板的热镀锌过程中形成。一般认为合金元素的偏聚是几十到几百微米漏镀缺陷形成的原因,这些缺陷可以通过金相显微镜和SEM进行较好的表征分析以确定其形成原因。但是,针对几微米的针孔漏镀以及存在其他附生组... 漏镀缺陷易在先进高强汽车钢板的热镀锌过程中形成。一般认为合金元素的偏聚是几十到几百微米漏镀缺陷形成的原因,这些缺陷可以通过金相显微镜和SEM进行较好的表征分析以确定其形成原因。但是,针对几微米的针孔漏镀以及存在其他附生组织的漏镀缺陷,传统平面样和截面样的观察方法无法精细表征,对其形成机制的认知尚有不足。本研究针对广泛应用于汽车板的热镀锌780 MPa级双相钢,通过聚焦离子束切割技术对漏镀缺陷进行切割,制备了针对微米尺度漏镀缺陷的截面样品,并利用TEM对漏镀缺陷的结构及成分进行了表征。所得结果揭示了780 MPa级双相钢中存在的两种漏镀缺陷及其不同于一般认知的形成机制:第一种漏镀缺陷的形成是由于镀锌前钢基板表面存在坑状缺陷,这种漏镀缺陷内界面层物相和成分与未漏镀区域并无较大差异;第二种漏镀缺陷的形成是由于镀锌前钢基板表面存在铁颗粒,在镀锌过程中影响了正常的镀锌反应,这种漏镀缺陷内存在疏松的附生组织。为减少780 MPa级双相钢以及其他镀锌先进高强汽车钢板镀锌层中的这两种微米级漏镀缺陷,需要在钢板轧制阶段重点关注并减少表面坑状缺陷,并去除表面的多余铁颗粒。 展开更多
关键词 热镀锌 双相钢 聚焦离子束切割 透射电镜 漏镀缺陷结构
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电子轰击离子源离子聚焦性能仿真研究
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作者 李冠华 冯焱 +5 位作者 成永军 孙雯君 陈联 冯天佑 王星辉 杨喆 《真空与低温》 2025年第2期148-155,共8页
针对兰州空间技术物理研究所自研小型四极质谱计的电子轰击离子源(EI源),对其聚焦性能进行了仿真研究。利用仿真软件Simion8.0,采用控制变量法研究了EI源聚焦极电参数、极板间距离、极板孔径大小对离子聚焦性能的影响。结果表明:聚焦极... 针对兰州空间技术物理研究所自研小型四极质谱计的电子轰击离子源(EI源),对其聚焦性能进行了仿真研究。利用仿真软件Simion8.0,采用控制变量法研究了EI源聚焦极电参数、极板间距离、极板孔径大小对离子聚焦性能的影响。结果表明:聚焦极电压与电离室电压压差越大,聚焦性能越好,当聚焦极电压增大且逐渐接近电离室电压时,其聚焦性能会快速变差;同时增大各极板间距时,离子聚焦性能先变好后变差,最佳聚焦性能出现在电离室下极板和聚焦极以及聚焦极和引出极的间距都为1.25 mm时;减小电离室下极板孔径以及引出极极板孔径时,聚焦性能会显著变好,但传输效率会明显降低,当电离室下极板和引出极极板孔径不变时,改变聚焦极极板孔径,其聚焦性能随着聚焦极极板孔径变小而变好,当聚焦极孔径为1.6 mm或2.0 mm时聚焦性能最佳。以上仿真结果为EI源的工程化设计与优化提供了关键数据支撑。 展开更多
关键词 EI源 数值仿真 聚焦离子束
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FIB/SEM双束系统在微纳加工与表征中的应用 被引量:3
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作者 彭开武 《中国材料进展》 CAS CSCD 2013年第12期728-734,751,共8页
简要回顾了聚焦离子束/扫描电子显微镜双束系统在国家纳米科学中心的应用。围绕透射电镜样品制备、扫描电子显微镜与扫描离子显微镜、纳米材料的二维与三维表征等材料表征,以及离子束直接刻蚀加工如光子晶体阵列器件原型加工、材料沉积... 简要回顾了聚焦离子束/扫描电子显微镜双束系统在国家纳米科学中心的应用。围绕透射电镜样品制备、扫描电子显微镜与扫描离子显微镜、纳米材料的二维与三维表征等材料表征,以及离子束直接刻蚀加工如光子晶体阵列器件原型加工、材料沉积加工如用于电学性能测试的四电极制作、指定点加工如原子力显微镜针尖修饰、三维加工、电子束曝光及其与聚焦离子束联合加工等纳米结构加工两方面,以些具体实例分类进行了介绍。针对限制其应用的些不利因素,如加工效率低、面积小、精度不足、加工损伤等问题,些新技术如新型离子源Plasma、He+/Ne+离子等与现有Ga+聚焦离子束系统配合将成为未来发展方向。 展开更多
关键词 聚焦离子束 双束系统 纳米材料表征 纳米结构加工 电子束曝光 透射电镜样品制备
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FIB/SEM双束系统在微纳米材料电学性能测试中的应用 被引量:6
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作者 彭开武 《电子显微学报》 CAS CSCD 2016年第1期75-80,共6页
电学性能测试是微纳米材料物性研究的重要组成部分,测试电极的制备是其中一个难点。光学光刻、电子束曝光或聚焦离子束加工是三种不同的电极制备技术。每种技术都有自己的特点,采用何种技术取决于微纳米材料的尺寸、形态及测试目的等诸... 电学性能测试是微纳米材料物性研究的重要组成部分,测试电极的制备是其中一个难点。光学光刻、电子束曝光或聚焦离子束加工是三种不同的电极制备技术。每种技术都有自己的特点,采用何种技术取决于微纳米材料的尺寸、形态及测试目的等诸多因素。此外,选择适当的制样方法对后续的电学性能测试也很关键。本文以一台配备了电子束曝光功能附件的聚焦离子束(FIB)/扫描电子显微镜(SEM)双束系统为工具,结合光学光刻等其它加工技术,详细介绍了其针对不同类型微纳米材料进行电极制备的过程和方法。 展开更多
关键词 聚焦离子束 双束系统 微纳米材料 电学性能 电极制备 电子束曝光
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基于FIB加工和SEM-EDS技术联用对共格BCC/B2高熵合金的元素分布表征分析 被引量:1
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作者 史淑艳 王成林 +2 位作者 戚琳 马跃 邹龙江 《电子显微学报》 CAS CSCD 北大核心 2022年第3期258-264,共7页
BCC/B2高熵合金中体心立方结构(body centered cube, BCC)纳米粒子影响其软磁性能和高温力学性能。然而,扫描电子显微镜-能量色散谱仪(scanning electron microscopy-X-ray energy dispersive spectroscopy, SEM-EDS)难以表征BCC纳米粒... BCC/B2高熵合金中体心立方结构(body centered cube, BCC)纳米粒子影响其软磁性能和高温力学性能。然而,扫描电子显微镜-能量色散谱仪(scanning electron microscopy-X-ray energy dispersive spectroscopy, SEM-EDS)难以表征BCC纳米粒子的元素分布。本文利用聚焦离子束(focused ion beam, FIB)和SEM-EDS联用,制备BCC/B2高熵合金的纳米尺度薄片,并对其元素分布进行了研究。结果表明,AlCoFeCr高熵合金微观组织是由B2相与共格的BCC相构成,其中BCC粒子约为20~40 nm。对比SEM-EDS对块体试样和FIB制备的纳米尺度的薄片元素分布结果,FIB制备的纳米薄片提高了EDS的分辨率,BCC纳米粒子富集Cr元素,且B2基体相富集Al、Co和Fe元素。电子的加速电压和束流强度影响纳米薄片中BCC纳米粒子元素分布表征结果的准确性,其中30 kV 6.4 nA下元素分布表征结果的准确度最高。 展开更多
关键词 高熵合金 纳米颗粒 元素分布 聚焦离子束 扫描电子显微镜-能量色散谱仪
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Fabrication of Windowed Very-Small-Aperture Laser Diodes
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作者 康香宁 徐云 +2 位作者 宋国峰 叶晓军 陈良惠 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2003年第11期1145-1148,共4页
A windowed very small aperture laser (VSAL) source for use in high resolution near field optical data storage is fabricated.The windowed regions are introduced to avoid shorting the pn junction with metal coating a... A windowed very small aperture laser (VSAL) source for use in high resolution near field optical data storage is fabricated.The windowed regions are introduced to avoid shorting the pn junction with metal coating and suppress the COD effect.It facilitates producing VSAL by simplified technology and improves the laser performance.A VSAL with 400nm small aperture is demonstrated by focused ion beam (FIB) and the output power is 0 3mW at 31mA. 展开更多
关键词 very small aperture laser optical near field ridge waveguide focused ion beam
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